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dc.contributor.authorTosaka, Yuji
dc.contributor.authorPark, Jung-ran
dc.date.accessioned2018-01-26T16:35:53Z
dc.date.available2018-01-26T16:35:53Z
dc.date.issued2017
dc.identifier.citationJung-ran Park and Yuji Tosaka. Advancing Professional Learning in Libraries: An Exploratory Study of Cataloging and Metadata Professionals' Experiences and Perspectives on Continuing Education Issues. Cataloging & classification quarterly 55(3) (2017): 153-171.en_US
dc.identifier.urihttps://doi.org/10.1080/01639374.2016.1278418
dc.description.abstractBased on a set of web survey data, this study examines cataloging and metadata professionals' perspectives on issues surrounding continuing education. The results show that emerging data standards such as the Semantic Web and BIBFRAME, as well as metadata and digital library-related topics, are subject areas currently central to their professional concerns, in addition to RDA, for professional development. Topics such as ontologies, social tagging, and automatic metadata generation were rarely reported. Meaningful interactions were often found to be lacking in online education. The results provide evidence of the need to expand the pool of shared expertise to meet our collective needs for continuing education in the cataloging and metadata community.en_US
dc.description.sponsorshipInstitute of Museum and Library Servicesen_US
dc.language.isoen_USen_US
dc.publisherRoutledgeen_US
dc.subjectContinuing educationen_US
dc.subjectCatalogersen_US
dc.subjectMetadata professionalsen_US
dc.subjectSemantic Weben_US
dc.subjectRDAen_US
dc.subjectMetadataen_US
dc.subjectBIBFRAMEen_US
dc.titleAdvancing Professional Learning in Libraries: An Exploratory Study of Cataloging and Metadata Professionals' Experiences and Perspectives on Continuing Education Issuesen_US
dc.typeArticleen_US
dc.typeTexten_US
dc.typePostprinten_US
prism.publicationNameCataloging & classification quarterlyen_US
prism.volume55
prism.issueIdentifier3
prism.startingPage153
prism.endingPage171
dc.identifier.handlehttps://dr.tcnj.edu/handle/2900/2095


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